Ion beam separators

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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250298, 250400, H05K 306

Patent

active

040174034

ABSTRACT:
In an ion beam separator for use in ion implantation, the ion beam is scanned in both X and Y directions over a target. `Y` scan is achieved by electrostatic beam deflection located close to the region where the ion beam exits from the influence of the deflecting magnet. `X` scan is preferably provided by rectilinear target movement. Beam width or intensity control is achieved using a rotatable slit. Targets are transferred sequentially across the beam from a pack on one side and are re-stacked on the other side of the beam after exposure.

REFERENCES:
patent: 2816231 (1957-12-01), Nygard
patent: 3682729 (1972-08-01), Gukelberger, Jr. et al.
patent: 3689766 (1972-09-01), Freeman
patent: 3705320 (1972-12-01), Freeman

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