Photo-mask for use in manufacturing an optical memory disc, a me

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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430321, 428 65, G03F 100

Patent

active

048392510

ABSTRACT:
A photo-mask for use in manufacturing an optical memory disc has a substrate having a disc shape and made of a transparent material, and a film deposited on the substrate and formed with a predetermined pattern of grooves extending spirally or concentrically to the center of the disc shaped substrate such as to leave a thin film at the bottom of the grooves, and a number of microscopic pits in the form of minute indentations with a predetermined spacing aligned along the grooves so as to substantially leave no film at the bottom of the indentations. Thus, a light which has passed through the thin film at grooves is weakened and a light which has passed through the indentations loses substantially no power, and a light applied elsewhere on the film is cut off. The photo-mask is made through the steps of depositing an opaque film on a substrate having a disc shape and made of a transparent material, impinging a first laser at places where the grooves are to be formed, and impinging a second laser at places where the pits are to be formed. The first laser is weaker in power than the second laser.

REFERENCES:
patent: 4423137 (1983-12-01), Rester
patent: 4586173 (1986-04-01), Ando

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