Semiconductor wafer temperature determination by optical measure

Details Semiconductor wafer temperature determination by optical measure Semiconductor wafer temperature determination by optical measure

1992-04-15

1994-09-27

Paschall, Mark H.

Electric heating

Heating devices

With power supply and voltage or current regulation or...

21912143, 21912144, 219502, 374 55, 374120, 356386, H05B 102

Patent

active

053508998

ABSTRACT:
A method and apparatus are provided for measuring the temperature of articles such as semiconductor wafers in a sealed chamber of a processing apparatus such as a batch preheating module of a semiconductor wafer processing cluster tool. Wafers of generally known nominal diameter and coefficient of thermal expansion are placed at a known initial temperature into a processing chamber which is then sealed. A pair of beams of parallel light are passed by opposite edges of the wafer and the uninterrupted light from both beams are detected and summed. When the wafer is heated in processing, light from the beams is measured again. Expansion of the wafers changes the amount of uninterrupted light detected, and the changed amount of light is measured. From the measurement, the initial temperature, the nominal diameter and the known coefficient of expansion, processing temperature is calculated and displayed or used to control chamber heaters. The beams are preferably angled to the wafer planes so that vertical alignment is not critical and so that the beams are interrupted by a single wafer when in a stack. The signals from the detectors can be used to vertically position the wafers.

REFERENCES:
patent: 3788746 (1974-01-01), Baldwin et al.
patent: 3930730 (1976-01-01), Laurens et al.
patent: 4271477 (1981-06-01), Williams
patent: 4381152 (1983-04-01), Riech et al.
patent: 4426160 (1984-01-01), Couderc
patent: 4636969 (1987-01-01), Kyoden et al.
patent: 4775236 (1988-10-01), Cohen et al.
patent: 4854707 (1989-08-01), Ring et al.
patent: 5102231 (1992-04-01), Loewenstein et al.
patent: 5221142 (1993-06-01), Snow

Affiliated with

Also associated with

Rating

Semiconductor wafer temperature determination by optical measure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor wafer temperature determination by optical measure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor wafer temperature determination by optical measure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1266962