Photographic radiation-sensitive materials having improved antis

Details Photographic radiation-sensitive materials having improved antis Photographic radiation-sensitive materials having improved antis

1979-06-07

1981-06-09

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

252518, 252521, 430528, 430530, 430637, G03C 178

Patent

active

042726166

ABSTRACT:
Photographic radiation-sensitive materials having an improved antistatic property which comprise a nonionic polyoxyethylene surface active agent and at least one of a thiocyanate, iodide, perchlorate and periodate in at least one layer.

REFERENCES:
patent: 2357380 (1944-02-01), Brant
patent: 2725297 (1955-11-01), Morey
patent: 3428456 (1969-02-01), Grabhoefer
patent: 3552972 (1971-01-01), Meyer
patent: 3769022 (1979-10-01), Ville et al.
Chem. Abstracts, vol. 67, 44379t, Fr. Pat. No. 1,466,072, Clovis.
Chem. Abstracts, vol. 88, 161400n, Gallyamov et al., 1977.
Chem. Abstracts, vol. 74, 8364v, Fr. Pat. No. 1,585,604, Villain.

Affiliated with

Also associated with

Rating

Photographic radiation-sensitive materials having improved antis does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photographic radiation-sensitive materials having improved antis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photographic radiation-sensitive materials having improved antis will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1264867