Method for forming pattern using lift-off

Details Method for forming pattern using lift-off Method for forming pattern using lift-off

1991-12-03

1993-03-02

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437228, 437944, 148DIG100, H01L 2144

Patent

active

051908921

ABSTRACT:
A method is for forming a pattern from a film which is deposited with a low directivity. A resist pattern is formed on a substrate. A first film is deposited with low directivity, and then a second film is deposited with high directivity. The first film is etched selectively using the second film as an etching mask. Then, the resist pattern is dissolved.

REFERENCES:
patent: 4771017 (1988-09-01), Tobin et al.

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