Short channel CMOS on 110 crystal plane

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357 231, 357 233, 357 60, H01L 2702, H01L 2904

Patent

active

048579866

ABSTRACT:
A monocrystalline silicon substrate having a (110) crystal plane is prepared. A CMOS transistor is formed on this substrate. An N channel MOS transistor and a P channel MOS transistor are formed in the surface of the semiconductor substrate. In each of these transistors the channel length is 1.5 .mu.m or less and the velocity saturation phenomenon of electrons is outstanding.

REFERENCES:
patent: 3476991 (1969-11-01), Mize et al.
patent: 3603848 (1977-09-01), Sato et al.
patent: 3634737 (1972-01-01), Maeda et al.
patent: 3860948 (1975-01-01), Ono et al.
patent: 3969753 (1976-07-01), Thorsen et al.
patent: 4268848 (1981-05-01), Casey et al.
patent: 4768076 (1988-08-01), Aoki
Kinagawa et al., IEDM Wash. D.C., Dec. 1-4, 1985, pp. 581-584.
Kohyama et al. "Directions in CMOS Technology", Int. Elec. Dev. Meeting, Dec. 1983, 7.1, pp. 151-154, Wash. D.C.
Sato et al., "Mobility Anisotropy of Electrons in Inversion Layers on Oxidized Silicon Surfaces," Physical Review, vol. 4, No. 6, pp. 1950-1960, Figure 2, Sep. 15, 1971.
Sato et al., "Drift Velocity Saturation of Holes in Si Inversion Layers", J. Phys. Soc. Japan (31) 1971, p. 1846.

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