Coating apparatus – With indicating – testing – inspecting – or measuring means
Patent
1997-04-30
2000-11-21
Bueker, Richard
Coating apparatus
With indicating, testing, inspecting, or measuring means
118666, 118725, 118728, 118729, B05C 1100
Patent
active
061497282
ABSTRACT:
A semiconductor manufacturing device uniformly grows a film on the surface of a wafer and reduces a turnaround time by shortening the time per process unit. The device includes a chamber, a plurality of lamps disposed on the upper end of the chamber to heat the wafer, and a plurality of pyrometers for supporting the wafer inserted into the wafer, detecting the inner temperature of the chamber and supporting the wafer onto a heat board as the wafer is heating to a predetermined temperature. The device further includes the heat board disposed on the lower end of the chamber to hold thereon the wafer lowered by the pyrometers and to keep the processing temperature, a wafer inlet or outlet formed on one side of the chamber, and reaction gas inlet and outlet formed on both sides of the chamber for injecting the reaction gas for growing the film on the wafer as the wafer is lowered onto the heat board.
REFERENCES:
patent: 5587019 (1996-12-01), Fujie
patent: 5710407 (1998-01-01), Moore
patent: 5830277 (1998-11-01), Johnsgard
Kim Sang Hyun
Park Jae Woo
Bueker Richard
Fieler Erin
Hyundai Electronics Industries Co,. Ltd.
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