Method of making metal-to-polysilicon capacitor

Details Method of making metal-to-polysilicon capacitor Method of making metal-to-polysilicon capacitor

1990-03-19

1992-04-28

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437 60, 437192, 437200, 437919, H01L 2170

Patent

active

051089416

ABSTRACT:
A metal-to-polysilicon capacitor, a floating-gate transistor containing such a capacitor, and a method for making the same is disclosed. The bottom plate of the capacitor is formed over a field oxide structure, and the multilevel dielectric is deposited thereover. The multilevel dielectric is removed from the capacitor area, and an oxide
itride dielectric is deposited over the exposed bottom plate and over the multilevel by way of LPCVD. A first layer of titanium/tungsten is preferably deposited prior to contact etch, and the contacts to moat and unrelated polysilicon are formed. Metallization is sputtered overall, and the metal and titanium/tungsten are cleared to leave the metallization filling the contact holes, and a capacitor having a titanium/tungsten and metal top plate.

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