Method for forming thin film and apparatus therefor

Details Method for forming thin film and apparatus therefor Method for forming thin film and apparatus therefor

1991-10-31

1994-06-14

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Ion plating or implantation

427561, 427562, 427566, 427577, 427242, 427425, 118500, B05D 306, B05D 312, B05C 1300

Patent

active

053208773

ABSTRACT:
In an apparatus for forming a thin film on substrates, two substrate supporters having respective recesses therein are connected by a shaft so that the recesses oppose one another, and opposing ends of many rod-like substrates are supported on the side walls of the recesses. Then, the substrates are rotated on the side walls as the substrate supporters are revolved, and the substrates shift their positions under their own weight. In this state, deposition particles impinge against the substrates from a material source, while the rod-like substrates are stirred so that each region of the outer peripheries thereof has an equal probability of having the film deposited thereon. Thus, a uniform thin film is formed on the surface of every substrate. The numbers of recesses may be two or more. Further, a nest of substrate supporters may be used.

REFERENCES:
patent: 533303 (1895-01-01), Lee
patent: 1290202 (1919-01-01), Horan
patent: 3517644 (1970-06-01), Baer et al.
patent: 3583363 (1971-06-01), Shrader
patent: 3608519 (1971-09-01), Bean et al.
patent: 3977926 (1976-08-01), Johnson, Jr. et al.
patent: 4055683 (1977-10-01), Gusarov et al.
patent: 4207356 (1980-06-01), Waugh
patent: 4516523 (1985-05-01), Knox
patent: 4725345 (1988-02-01), Sakamoto et al.
patent: 4833031 (1989-05-01), Kurokawa et al.
patent: 4961958 (1990-10-01), Desphandey et al.
patent: 4992298 (1991-02-01), Deutchman et al.
patent: 5038707 (1991-08-01), Swain et al.
patent: 5090350 (1992-02-01), Hammond et al.
patent: 5112644 (1992-05-01), Seddon et al.
"Diamond Thin Films", C & E News, pp. 32-33 May 15, 1989.

Affiliated with

Also associated with

Rating

Method for forming thin film and apparatus therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming thin film and apparatus therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming thin film and apparatus therefor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1247969