Adhesive bonding and miscellaneous chemical manufacture – Methods – Surface bonding and/or assembly therefor
Patent
1997-11-26
2000-08-29
Ball, Michael W.
Adhesive bonding and miscellaneous chemical manufacture
Methods
Surface bonding and/or assembly therefor
1562755, 1562757, 1563796, 21912129, 2191213, 2504923, 250397, 250400, B32B 3128, B29C 7104
Patent
active
061103187
ABSTRACT:
Provided is the ability to selectively irradiate a designated irradiation target portion of a target material with a beam of electrons. Target material is moved at a substantially constant velocity in one direction along a path that is intersected by an electron beam. The electron beam is translated in a direction transverse to the direction of the target material movement to intersect the designated portion of the target. This enables the designated target portion, e.g., a target irradiation path, to be followed by the electron beam as the target material moves past the beam. Also provided is control of electron beam dose delivered to the designated irradiation target portion. Here, as a target material is moved along the path, the electron beam is also scanned in a direction parallel with the direction of target material movement to control the electron beam dwell time at points along the designated irradiation target portion, to deliver a specified electron beam dose to points along the designated portion of the target material. This scanning can control the electron beam dwell time to deliver a substantially uniform electron beam dose or to deliver an electron beam dose that falls within a specified range of allowable electron beam doses. Also provided is the ability to control the electron beam in response to feedback signals. Here the actual position of the electron beam intersection with the target is detected, and the electron beam translation is adjusted in response to the detected intersection position to maintain intersection of the electron beam with the designated portion of the target material. Additionally, the electron beam scanning can be adjusted in response to the detected intersection position to maintain delivery of the specified electron beam dose to the designated target portion. Preferably, sensors are positioned in a spaced relationship with the designated target portion, e.g., on the target material, in a configuration that defines the designated portion as a path between the sensors.
REFERENCES:
patent: 3463900 (1969-08-01), Downing
patent: 3483350 (1969-12-01), Pohl
patent: 3641342 (1972-02-01), Armel et al.
patent: 4117340 (1978-09-01), Goto et al.
patent: 4164640 (1979-08-01), Scheffels
patent: 4229639 (1980-10-01), Koy et al.
patent: 4278866 (1981-07-01), Nevins et al.
patent: 4342793 (1982-08-01), Skinner
patent: 4376886 (1983-03-01), Sciaky et al.
patent: 4484341 (1984-11-01), Luniewski
patent: 4585943 (1986-04-01), Yasuda et al.
patent: 4591688 (1986-05-01), Koch et al.
patent: 4973818 (1990-11-01), Bittenbrunn et al.
patent: 5099133 (1992-03-01), Yamada
patent: 5338588 (1994-08-01), Billiu
patent: 5610406 (1997-03-01), Kai et al.
patent: 5659223 (1997-08-01), Goodman
Campbell et al., "Electron Beam Curing Studies of Selected Thermosetting Adhesives," 23rd International SAMPE Symposium, Proceedings 23, pp. 1111-1114, 1978.
Cleland, "High Power Electron Accelerators for Industrial Radiation Processing," Radiation Processing of Polymers, Ch. 3, pp. 23-49, Singh et al. Eds., Hanser Publishers, New York, 1992.
Goodman et al., "Composite Curing With High Energy Electron Beams," 41st International SAMPE Symposium, Proceedings pp. 207-219, Mar. 24-28, 1996.
Vastava et al., "E-Beam Processing of Composite Structures," 42nd International SAMPE Symposium, Proceedings pp. 526-536, May 4-8, 1997.
Ball Michael W.
Lober Theresa A.
Science Research Laboratory
Tolin Michael A
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