Method of manufacturing a semiconductor device having a bump ele

Fishing – trapping – and vermin destroying

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437173, 437229, 430313, H01L 2128

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active

055653790

ABSTRACT:
In a process for manufacturing a semiconductor device having a bump electrode, a pad electrode for external connection is formed on a semiconductor substrate, and then a insulating layer having a opening exposing a predetermined portion at an upper surface of the pad electrode is formed. A resist having a thickness in the range of 10 .mu.m to 100 .mu.m is formed on the insulating layer, and then the resist is selectively exposed to a light from which light components having wavelength of 340 nm or less are excluded. After the resist is developed and the resist positioned on the opening provided in the insulating layer are selectively removed, a bump electrode which is electrically connected to the pad electrode is formed using residual resist as a mask. By way of the manufacturing method, since light having the wavelength in the vicinity of 300 nm to which the resist is significantly sensitive does not reach the resist, a phenomenon of a rapid polymerization reaction on the upper portion of the resist of the exposed region can be prevented. As a result, verticality of the side face of the bump electrode with respect to the main surface of the semiconductor substrate is enhanced.

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