Coating apparatus for semiconductor process

Details Coating apparatus for semiconductor process Coating apparatus for semiconductor process

1997-08-26

2000-08-29

Edwards, Laura

Coating apparatus

With indicating, testing, inspecting, or measuring means

118324, 118410, B05C 500

Patent

active

061102822

ABSTRACT:
A coating apparatus for coating an LCD substrate with a developing liquid for a photo-resist has a conveyer mechanism for linearly conveying the substrate in a conveying direction. The conveyer mechanism has a plurality of lower conveyer rollers which are driving rollers, and a plurality of upper conveyer rollers which are driven rollers. A main support roller is arranged such that it replaces one of the lower conveyer rollers. A developing liquid supply nozzle is arranged above the main support roller for supplying a developing liquid onto the substrate when the substrate is passing over the main support roller. The supply nozzle has a supply port which is laterally long and narrow, so that the developing liquid is supplied onto the substrate from the supply nozzle as a band. This band extends over the entire width of a target region of the substrate, which is perpendicular to the conveying direction, and is supplied thereto all at once.

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patent: 4762578 (1988-08-01), Burgin, Jr. et al.
patent: 5186451 (1993-02-01), Hira
patent: 5232501 (1993-08-01), Pender et al.
patent: 5529081 (1996-06-01), Kappler

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