Multiple beam exposure system

Details Multiple beam exposure system Multiple beam exposure system

1978-08-09

1979-05-08

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396R, H01J 3700

Patent

active

041538439

ABSTRACT:
In an improved electron beam exposure system (EBES), a demagnified image of an array (28) of illuminated apertures is focused and scanned over the surface of a resist-coated workpiece (12). A deflection unit (30) is associated with the array of apertures to provide an independent blanking capability for each of the electron beams propagated through the aperture array. Such an EBES can be operated in a faster mode than a conventional system. In addition, the electron dose delivered to each address position on the resist coating (10) can be thereby selectively controlled. Other forms of charge particles may also be used.

REFERENCES:
patent: 3491236 (1970-01-01), Newberry
patent: 3619608 (1971-11-01), Westerberg
patent: 3715580 (1973-02-01), Maekawa et al.
patent: 3736425 (1973-05-01), Chernow
patent: 3801792 (1974-04-01), Lin
patent: 3914608 (1975-10-01), Malmberg
patent: 4093964 (1978-06-01), Aughton

Affiliated with

Also associated with

Rating

Multiple beam exposure system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multiple beam exposure system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple beam exposure system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1235225