Method for producing a silica mask on a semiconductor substrate

Details Method for producing a silica mask on a semiconductor substrate Method for producing a silica mask on a semiconductor substrate

1974-12-13

1977-08-09

Pianalto, Bernard D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

148 15, 427 95, B05D 306

Patent

active

040411907

ABSTRACT:
A high precision silica coating, is provided. A thin film of a resin, from the polysiloxane group, for instance polyvinylsiloxane, is irradiated by 10,000 electron-volts. The resin converts in an insoluble product in the areas exposed according a predetermined pattern. After a heat treatment in oxidizing atmosphere, the remainder of the film is eliminated.

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patent: 3055776 (1962-09-01), Stevenson et al.
patent: 3056735 (1962-10-01), Smith-Johannsen
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patent: 3179546 (1965-04-01), Fischer
patent: 3617187 (1971-11-01), Chitrin
patent: 3627836 (1971-12-01), Getson
patent: 3632399 (1972-01-01), Burlant
patent: 3681113 (1972-08-01), Yoldas
patent: 3718474 (1973-02-01), Kolb et al.
patent: 3825466 (1974-07-01), Martin et al.
patent: 3836598 (1974-09-01), Wheeler
patent: 3865588 (1975-02-01), Ohto et al.
patent: 3877980 (1975-04-01), Martin et al.

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