Photocopying – Projection printing and copying cameras – Step and repeat
Patent
1997-10-27
1999-11-23
Metjahic, Safet
Photocopying
Projection printing and copying cameras
Step and repeat
430 5, G03B 2742, G03F 900
Patent
active
059910062
ABSTRACT:
A method of transforming the exposure pattern is provided so as to obtain a transferred image as being closest possible to the object design pattern in a lithography process. The method includes the steps of dividing a visible outline of desired design pattern P into a plurality of edges according to a specified rule, then assigning a plurality of evaluation points H to each of the edges; computing a transferred image of an exposed pattern by simulation; computing a distance between each evaluation point H on each edge E and a position corresponding to each evaluation point H of the transferred image of the exposed pattern; and determining a corrected exposure pattern by inputting the distance to a specified evaluation function to correct the position of each edge E according to the output value of the evaluation function.
REFERENCES:
patent: 5422491 (1995-06-01), Sakamoto
patent: 5561317 (1996-10-01), Momma et al.
patent: 5667923 (1997-09-01), Kanata
patent: 5698346 (1997-12-01), Sugawara
patent: 5700601 (1997-12-01), Hasegawa et al.
patent: 5792581 (1998-08-01), Ohnuma
patent: 5825647 (1998-10-01), Tsudaka
Kananen Ronald P.
Metjahic Safet
Nguyen Hung Henry
Sony Corporation
LandOfFree
Method and apparatus for correcting exposure patterns, and expos does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for correcting exposure patterns, and expos, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for correcting exposure patterns, and expos will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1227987