Solvent-less vapor deposition apparatus and process for applicat

Details Solvent-less vapor deposition apparatus and process for applicat Solvent-less vapor deposition apparatus and process for applicat

1994-11-21

1996-05-07

Bueker, Richard

Coating processes

Coating by vapor, gas, or smoke

Organic coating applied by vapor, gas, or smoke

118724, 118725, 118726, C23C 1400

Patent

active

055144144

ABSTRACT:
Apparatus and method for condensing a solderless flux vapor onto a work surface to be soldered, such as an electronic circuit board. The flux vapor is created by heating flux in a liquid state to a temperature greater than the temperature of the work surface. Flux is applied to the work surface without the use of any volatile organic chemicals.

REFERENCES:
patent: 4055217 (1977-10-01), Chu et al.
patent: 4090843 (1978-05-01), Chu et al.
patent: 4264642 (1981-04-01), Ferralli
patent: 4800105 (1989-01-01), Nakayama et al.
patent: 4821948 (1989-04-01), Fisher et al.
patent: 4871105 (1989-10-01), Fisher et al.
patent: 4921723 (1990-05-01), Nichols et al.
patent: 5024856 (1991-06-01), Hohnerlein
patent: 5164022 (1992-11-01), Pine et al.
patent: 5281281 (1994-01-01), Stefanowski

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