Exposure methods for overlaying one mask pattern on another

Details Exposure methods for overlaying one mask pattern on another Exposure methods for overlaying one mask pattern on another

1999-01-25

1999-11-23

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 30, G03F 900

Patent

active

059897619

ABSTRACT:
An exposure method in which mask patterns are overlaid on one another on a substrate, which is an object to be exposed, by using a first and second exposure apparatuses having respective exposure fields of different sizes. The exposure method includes the steps of: sequentially transferring a first mask pattern onto the substrate in the form of a first array in units of a shot area of a predetermined size by using the first exposure apparatus; detecting at least either one of a perpendicularity error of the first array from a design value and a mean value of rotation angles of the shot areas in the first array when a second mask pattern is to be sequentially transferred onto the substrate in the form of a second array in units of a shot area different in size from the unit shot area of a predetermined size by using the second exposure apparatus; and rotating the second mask pattern and the substrate relative to each other through an angle corresponding to a result of the detection, and thereafter, sequentially transferring the second mask pattern onto the substrate.

REFERENCES:
patent: 4708466 (1987-11-01), Isohata et al.
patent: 4734746 (1988-03-01), Ushida
patent: 4792693 (1988-12-01), Yamaguchi et al.
patent: 5434026 (1995-07-01), Takatsu et al.
patent: 5468580 (1995-11-01), Tanaka

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