Photo mask and method for fabricating semiconductor devices usin

Details Photo mask and method for fabricating semiconductor devices usin Photo mask and method for fabricating semiconductor devices usin

1998-04-06

1999-11-23

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059897562

ABSTRACT:
A photoresist mask for use in a photolithographic process for fabricating semiconductor devices. The photo mask including a transparent substrate, and at least two light blocking regions. The at least two light blocking regions are separated by a first opening and arranged at a first pitch P.sub.1 satisfying the following relationship on a main surface of the transparent substrate in a first direction:

REFERENCES:
patent: 5424154 (1995-06-01), Borodovsky
patent: 5429897 (1995-07-01), Yoshioka et al.
patent: 5563012 (1996-10-01), Neisser
patent: 5733687 (1998-03-01), Tanaka et al.

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