Manufacturing method of an X-ray exposure mask

Details Manufacturing method of an X-ray exposure mask Manufacturing method of an X-ray exposure mask

1990-01-18

1993-01-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

378 35, G03F 900

Patent

active

051789779

ABSTRACT:
A method of manufacturing an X-ray exposure mask comprises steps of forming a membrane including a layer of crystalline silicon carbide on a silicon substrate, processing a top surface of the membrane such that the top surface becomes a mirror-flat top surface, depositing a layer of X-ray absorbing material on the mirror-flat top surface of the membrane, and patterning the layer of the X-ray absorbing material according to a desired semiconductor pattern.

REFERENCES:
patent: 3873824 (1975-03-01), Bean et al.
patent: 4253029 (1981-02-01), Lepselter et al.
patent: 4608326 (1986-08-01), Neukermans et al.
patent: 4941942 (1990-07-01), Bruns et al.
patent: 4971851 (1990-11-01), Neukermans et al.
patent: 5005075 (1991-04-01), Kobayashi et al.
Luethje et al. describes a technological background of the X-ray exposure mask fabrication together with possibility of using SiC for the mask. "Stability of SiC-Mask . . . ", Microelectronics Eng. 5 (1986) 39.

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