Method of forming ultrafine patterns

Details Method of forming ultrafine patterns Method of forming ultrafine patterns

1985-07-03

1987-12-15

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 431, B05D 306

Patent

active

047132582

ABSTRACT:
A method of forming an ultrafine pattern, said method comprising selectively forming adsorption sites on a substrate surface by irradiation with a focused electron beam in a vacuum and then depositing a pattern-forming substance onto the substrate by vacuum vapor deposition, chemical vapor deposition, sputtering or other suitable deposition methods, thereby forming the aimed ultrafine patterns. The method can provide ultrafine patterns in a very high resolution or precision by means of an electron beam irradiation and deposition technique under carefully controlled process conditions and, particularly, the electron beam irradiation in the presence of oil gas results in a better quality of pattern.

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