Method of using a compensation mask to correct particle beam pro

Details Method of using a compensation mask to correct particle beam pro Method of using a compensation mask to correct particle beam pro

1996-12-27

1999-03-30

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 5, 430296, 430942, G03F 900

Patent

active

058886826

ABSTRACT:
Methods and apparatus for accurately performing proximity-effect compensation exposure are disclosed, even in cases where negative-type particle-beam-sensitive resist material is used. On a compensation mask, regions corresponding to regions on an underlying wafer that are to receive die patterns are subdivided into a multiple subfields having a pitch smaller than the spread width of particles back-scattered from the wafer 7. Certain of the subfields on the compensation mask define an aperture allowing passage therethrough of a particle beam. The aperture sizes are not uniform. Rather, each aperture is equal in area to an area of the nominally unexposed regions of the subfield less a prescribed constant area. The particle beam, after passing through a beam-shaping aperture, irradiates the compensation mask via an objective lens, and is scanned across the compensation mask by deflectors.

REFERENCES:
patent: 5254438 (1993-10-01), Owen et al.
patent: 5316879 (1994-05-01), Berger et al.

Affiliated with

Also associated with

Rating

Method of using a compensation mask to correct particle beam pro does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of using a compensation mask to correct particle beam pro, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of using a compensation mask to correct particle beam pro will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1213078