Process for high pressure oxidation of silicon

Details Process for high pressure oxidation of silicon Process for high pressure oxidation of silicon

1980-10-01

1981-10-06

Smith, John D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

65 36, 118733, 422295, 427255, 4272551, 4272554, 427294, 357 23, H01L 2316

Patent

active

042935890

ABSTRACT:
A process for high pressure oxidation of silicon comprising the steps of inserting silicon wafers and an oxidizing substance into a quartz capsule sealing the quartz capsule gas-tightly by fusing, and heating the quartz capsule to generate a high pressure oxidizing atmosphere therein and to form an oxide film on the silicon wafers without a flow of the oxidizing atmosphere. In a case where water is used as the oxidizing substance, the water is frozen and the inside space of the quartz capsule is exhausted before the sealing operation. Furthermore, in a case where an oxidizing gas, e.g. oxygen gas, is used as the oxidizing substance, if the pressure of the gas is higher than the ambient pressure, the quartz capsule is cooled to decrease the gas pressure to a pressure below the ambient pressure before the sealing operation.

REFERENCES:
patent: 3047438 (1962-07-01), Marinace
patent: 3526205 (1970-09-01), Rosenheinrich
patent: 3984267 (1976-10-01), Craford
patent: 4002512 (1977-01-01), Lim
patent: 4139658 (1979-02-01), Cohen
patent: 4167915 (1979-09-01), Toole et al.
Tsubouchi N. et al., "Oxidation of Silicon in High Pressure Steam", Japan J. Appl. Phys., vol. 16, No. 5 (1977).
Panousis, "High Pressure Steam Apparatus for the Accelerated Oxidation of Silicon", Abstract No. 53, Spring Meeting of Electrochemical Soc., May 1973.
Chamberlin et al., IBM Tech. Dis. Bull., "Diffusion using . . . Source", vol. 6, No. 1, p. 114 (1963).
Zeto et al., J. Electrochemical Soc., "Low Temp. . . . 1ATM", vol. 122, No. 10, pp. 1409-1410 (10-1975).
Ligenza, J. Electrochemical Soc., "Oxidation . . . Steam", vol. 109, No. 2, pp. 73-76 (1962).
Powell, "Selective . . . Steam", IEEE Trans. Electron Devices, vol. Ed.-21, pp. 636-640 (10-1974).

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