Chemical vapor deposition system cleaner

Cleaning and liquid contact with solids – Processes – Using solid work treating agents

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134 10, 134 2211, 134 2212, 134 19, 134 1, 134 34, 134 21, 134166R, 134166C, 15 56, B08B 908

Patent

active

052863018

ABSTRACT:
An apparatus for cleaning the interior surfaces of a vessel which includes a cleaning head supported and guided into the vessel by a rigid air shaft. The cleaning head is supplied with a process fluid and directs and removes the process fluid from a cleaning zone located on the interior surface of the vessel. The process fluid is heated by a heat exchanger hose assembly that is connected to the air shaft. The apparatus utilizes turbulent fluid flow, thermal shock, ultrasonic vibration and/or piezoelectric vibration to dislodge particulates from the inner surfaces of the vessel. The apparatus is useful for cleaning chemical vapor deposition reactors and other similar vessels.

REFERENCES:
patent: 1869730 (1932-08-01), Antle
patent: 3774262 (1973-11-01), Anthony et al.
patent: 3946459 (1976-03-01), Armstrong
patent: 4266316 (1981-05-01), Schneider et al.
patent: 4426566 (1984-01-01), Coughlin et al.
patent: 4473921 (1984-10-01), Weber et al.
patent: 4486238 (1984-12-01), Bando
patent: 4500492 (1985-02-01), Yamakawa
patent: 4543684 (1985-10-01), Bandoh et al.
patent: 4720889 (1988-01-01), Grave
patent: 4792363 (1988-12-01), Franklin, Jr. et al.
patent: 4976002 (1990-12-01), Leonov et al.
Cheung, S. D., et al, "Monitor Particles in Real Time to Sleuth Contamination Sources", Semiconductor International, Oct. 1988, pp. 98-102.
Gill, P., and Dillenbeck, K. "Using Snake Patterns to Monitor Defects and Enhance VLSI Device Yields", Microcontamination, Mar. 1989, pp. 33-36, 60.

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