Method of making photoconductive coating

Details Method of making photoconductive coating Method of making photoconductive coating

1980-04-21

1982-12-14

O'Keefe, Veronica

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192S, 430128, 430133, B23C 1500

Patent

active

043637116

ABSTRACT:
A method of making a photoconductive coating of the type which comprises a crystalline layer of wholly inorganic material on a suitable substrate for use as an electrophotographic member, said method including the steps of depositing the coating in a vacuum chamber by sputtering with R.F. energy in such a manner that the deposit is crystalline, with the individual crystals oriented substantially vertically, the size of the crystals being uniform and hexagonal in configuration and of the order of 700 to 800 Angstroms in diameter and with a barrier layer coating on the surface that is of extreme resistivity, each crystal acting independently as an independent field domain, the crystal length normal to the substrate being the same as the coating thickness and the deposit evidencing single crystal configuration in response to diffraction pattern measurements. Background gas, including minute measured quantities of oxygen, being introduced during the sputtering and permitted to react with the surface of the sputtered coating.

REFERENCES:
patent: 2769778 (1956-11-01), Preston
patent: 4025339 (1977-05-01), Kuehnle
patent: 4033843 (1977-07-01), Krikorian

Affiliated with

Also associated with

Rating

Method of making photoconductive coating does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making photoconductive coating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making photoconductive coating will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1200792