X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1993-06-24
1994-12-13
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 81, 378149, G01N 23207
Patent
active
053735447
ABSTRACT:
An x-ray diffractometer is equipped with a position sensitive detector and a collimator preceding the detector. The lamellae of the collimator are radially aligned to the specimen, which is arranged in the center of a measurement circle along which the detector and collimator move during a measurement. Therefore, only the x-radiation scattered at the specimen contributes to the measured signal. An elliptically deformed multi-layer mirror is provided at the primary beam side, which deflects the source radiation in the direction of the specimen without great intensity loss and focuses it at a point lying on the measurement circle. Analysis of powdered specimens that are enclosed in glass capillaries can be undertaken. A low-background measurement of diffraction diagrams in an x-ray diffractometer given efficient use of the primary beam is achieved.
REFERENCES:
patent: 2805342 (1957-09-01), Lang
patent: 4144450 (1979-03-01), Goebel
patent: 4274000 (1981-06-01), Goebel
patent: 4910758 (1990-03-01), Herrick
patent: 5046077 (1991-09-01), Murayama
Patent Abstracts of Japan, vol. 017, No. 399 (P-1579), Jul. 26, 1993.
"Identifizierung kristalliner Phasen und Phasenkinetik von Festkorperreaktionen durch Pulver-Rontgendiffratktometrie," Gobel, Siemens Forsch.-u. Entwickl. Ber., vol. 14, No. 4 (1985) pp. 167-176.
Porta David P.
Siemens Aktiengesellschaft
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