Method for cleaning a substrate

Details Method for cleaning a substrate Method for cleaning a substrate

1992-11-09

1994-12-13

Dean, Richard O.

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

134 1, 134 2, 134 6, B08B 304, B08B 312, C03C 2300

Patent

active

053726510

ABSTRACT:
A substrate cleaning method and equipment for removing foreign metters adhered to a substrate, the method comprising the steps of: making hydrophilic a surface of the substrate; causing pure water to diffusively permeate the hydrophilic surface of the substrate, thereby forming a layer of aqueous particles on the substrate surface; removing the foreign matters on the substrate in which the pure water diffusively permeated; and dipping, into hot pure water, the substrate in which the pure water diffusively permeated and then drying the substrate surface by relatively moving the hot water and the substrate.

REFERENCES:
patent: 4569695 (1986-02-01), Yamashita et al.
patent: 5078832 (1992-01-01), Tanaka

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