Positive type photoresist composition comprising as a photosensi

Details Positive type photoresist composition comprising as a photosensi Positive type photoresist composition comprising as a photosensi

1991-03-18

1992-10-06

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430193, 534556, 534557, G03F 7022, G03F 7023

Patent

active

051530961

ABSTRACT:
A positive type photoresist composition comprising at least one light-sensitive material, as defined herein, and an alkali-soluble novolak resin, has a high resolving power, particularly when used in semiconductor devices, accurately reproduces mask dimensions over a wide photomask line width range, from a resist pattern in a cross-sectional form having a high aspect ratio in a pattern having a line width of no greater than 1 .mu.m, has a wide developing latitude and excellent heat resistance.

REFERENCES:
patent: 3188210 (1985-06-01), Fritz et al.
patent: 4407926 (1983-10-01), Stahlhofen
patent: 4424270 (1984-01-01), Erdman et al.
patent: 4517275 (1985-05-01), Stahlhofen
patent: 4555469 (1985-11-01), Erdman et al.
patent: 4732836 (1988-03-01), Potuin et al.
patent: 4732837 (1988-03-01), Potuin et al.
patent: 4812551 (1989-03-01), Oi et al.
patent: 4837121 (1989-06-01), Blakeney et al.
English translation of Japanese Publication #60-121,445, Published Jun. 28, 1985, (Hosaka et al.).

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