Sequential automatic registration and imagewise exposure of a sh

Details Sequential automatic registration and imagewise exposure of a sh Sequential automatic registration and imagewise exposure of a sh

1982-06-11

1985-06-11

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430291, 430293, 430319, 430322, 430327, 430396, 430394, G03F 900

Patent

active

045229031

ABSTRACT:
Method for repetitive registering and imagewise exposing to actinic radiation a sheet substrate containing a photosensitive layer with use of a sequence of related photomasks. A liquid layer separates the photosensitive layer and each photomask during the exposure step.

REFERENCES:
patent: 3547730 (1970-12-01), Cohen et al.
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 4201581 (1980-05-01), Thomas et al.
patent: 4281922 (1981-08-01), Matsumoto
patent: 4334009 (1982-06-01), Charles et al.
Tokyo Ohka Kogyo Co., Ltd., Sep. 1981, YN2000, Japan.

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