Alignment and exposure apparatus

Details Alignment and exposure apparatus Alignment and exposure apparatus

1989-05-30

1990-02-13

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, G03B 2742, G03B 2774, G03B 2780

Patent

active

049011090

ABSTRACT:
An alignment and exposure apparatus for aligning an original such as a reticle and a workpiece such as a wafer and for photolithographically transferring a pattern of the original onto the workpiece. The alignment of the original and the workpiece is achieved by detecting diffractively scattered light from alignment marks of the original and the workpiece. For this alignment, plural and different wavelengths are used. One of the wavelengths which is close to an exposure wavelength is used to detect both the original and the workpiece. Another wavelength is used to detect only the workpiece. By this, high-accuracy alignment of the original and the workpiece is ensured.

REFERENCES:
patent: 3865483 (1975-02-01), Wojcik
patent: 4355892 (1982-10-01), Mayer et al.
patent: 4437758 (1984-03-01), Suzuki

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