Photoreactive coating compositions and photomechanical plates pr

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430162, 430287, 430288, 430292, 430302, 430333, 430345, 430346, G03C 152, G03F 702

Patent

active

042256615

ABSTRACT:
A photoreactive coating composition, particularly suited for use in a lithographic plate, is characterized by both reduced exposure time requirements and an intense visual image which is immediately produced upon exposure of the composition to light permitting visual inspection during imaging. The photoreactive composition has a diazo resin layer and an overlayer which includes a photochromic compound (e.g. an indolinobenzospiropyran compound) and a light sensitive polymer selected from the group cinnamoylated and acrylated photopolymer resins.

REFERENCES:
patent: 3042515 (1962-07-01), Wainer
patent: 3804628 (1974-04-01), Osada et al.
patent: 3808004 (1974-04-01), Thomas et al.
patent: 3923524 (1975-12-01), Haase
patent: 3986880 (1976-10-01), Wainer et al.

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