Photomask with corrected white defects

Details Photomask with corrected white defects Photomask with corrected white defects

1983-05-19

1985-04-09

Kittle, John

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430938, 430945, 427 531, 427142, 427140, G03F 900

Patent

active

045102228

ABSTRACT:
A photomask with white defects that have corrected with a film comprising a mixture of silver and tantalum oxide. The film has a good resistance to chemicals.

REFERENCES:
patent: 4023961 (1977-05-01), Douglas et al.
patent: 4340654 (1982-07-01), Campi
patent: 4444801 (1984-04-01), Hongo et al.
patent: 4463073 (1984-07-01), Miyauchi et al.

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