Chemistry of carbon compounds – Miscellaneous organic carbon compounds – C-metal
Patent
1978-12-29
1980-09-30
Trousof, Natalie
Chemistry of carbon compounds
Miscellaneous organic carbon compounds
C-metal
260566R, C07C11900
Patent
active
042255104
ABSTRACT:
In the preparation of perchloro-2,5-diaza-1,5-hexadiene by chlorination of N,N-dimethylaminoacetonitrile, the improvement which comprises in a first stage (a) chlorinating N,N-dimethylaminoacetonitrile or its hydrochloride at about 70.degree. to 80.degree. C. in a solvent, removing the solvent by distillation under chlorinating conditions until a bottom temperature of about 120.degree. to 160.degree. is reached, and after-treating the residual reaction at this temperature with chlorine, and in a second stage (b) chlorinating the resulting reaction mixture at a temperature from about 150.degree. to 220.degree. C. Advantageously the solvent in stage (a) is phosphorus oxychloride, the weight ratio of nitrile to solvent is about 1:3, the after-chlorination in stage (a) is carried out at a temperature from about 120.degree. to 140.degree. C., and stage (b) is carried out at a temperature from about 180.degree. to 210.degree. C. in a multi-stage bubble column cascade reactor operated with gas and liquid in counter-current.
REFERENCES:
patent: 3206516 (1965-09-01), Ziegenbein et al.
patent: 3251760 (1966-05-01), Holtschmidt et al.
patent: 3267144 (1966-08-01), Ottmann et al.
patent: 3301893 (1967-01-01), Degener et al.
Beck, von Gunther et al. Angew. Chem., vol. 86, p. 134 (1974).
Krall Hermann D.
Schwarz Herbert
Bayer Aktiengesellschaft
Hendriksen L.
Trousof Natalie
LandOfFree
Preparation of perchloro-2,5-diaza-1,5-hexadiene does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Preparation of perchloro-2,5-diaza-1,5-hexadiene, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Preparation of perchloro-2,5-diaza-1,5-hexadiene will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1168983