Method and apparatus

Details Method and apparatus Method and apparatus

1972-12-20

1976-11-02

Hart, Charles N.

Liquid purification or separation

With alarm, indicator, register, recorder, signal or...

Responsive to fluid flow

210 37B, 210175, 210269, C02B 142, C02B 156

Patent

active

039896242

ABSTRACT:
The invention provides a method and apparatus for rinsing an object which has been removed from a chromium plating bath, and which has a source of chromium-containing anions thereon, while preventing the delivery of these anions to the environment. In carrying out the invention, chromium-containing anions are removed from the rinse water by an anion-exchange resin. The resin is periodically regenerated by backwashing it, delivering a dilute alkali metal hydroxide solution to the resin, delivering a more concentrated solution of alkali metal hydroxide to the resin, and by rinsing the resin. Effluent from the backwashing and the initial portion of the regeneration procedure is retained and later delivered to the resin. Effluent which contains a higher concentration of chromate ions, displaced from the resin, is delivered to a concentrated chromate solution storage tank. As the regeneration progresses, the effluent becomes richer in hydroxide ions, and this effluent is delivered first to the dilute and then to the concentrated anion regenerant tank for re-use. Finally, the resin is rinsed, and the final effluent is delivered to the dilute chromate solution tank. Water which has passed through the resin is used for regenerant solution makeup and for rinsing and backwashing, as well as for rinsing plated articles.

REFERENCES:
patent: 3531401 (1970-09-01), Crits
patent: 3658470 (1972-04-01), Zievers et al.
patent: 3664950 (1972-05-01), Saraceno et al.
patent: 3681210 (1972-08-01), Zievers et al.
patent: 3761381 (1973-09-01), Yagishita
Arden et al., Journal of Applied Chemistry, vol. 11, July, 1961, pp. 229-234.
Dorfner, Ion Exchangers; Properties and Applications, 1972, pp. 177-180.

Affiliated with

Also associated with

Rating

Method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1157984