Solubilization-inhibitor and positive resist composition

Details Solubilization-inhibitor and positive resist composition Solubilization-inhibitor and positive resist composition

1990-08-03

1993-04-13

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, 430270, 430914, G03C 152

Patent

active

052022170

ABSTRACT:
A positive resist composition comprising an aromatic group-containing alkali-soluble resin and a compound having an ammonium salt as skeleton, as the main components.

REFERENCES:
patent: 4506006 (1985-03-01), Ruckert
patent: 4696891 (1987-09-01), Guzzi
patent: 4792516 (1988-12-01), Toriumi et al.
patent: 4816380 (1989-03-01), Covington et al.
patent: 4996301 (1991-02-01), Wilharm et al.
Solid State Technology, vol. 24, No. 8, Aug. 1981, Washington US pp. 81-85; Chandross E. A. et al. "Photoresists for Deep UV Lith . . . ".

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