Method of manufacture employing electrochemically dispersed plat

Details Method of manufacture employing electrochemically dispersed plat Method of manufacture employing electrochemically dispersed plat

1982-10-07

1984-12-25

Tufariello, Thomas

Chemistry: electrical and wave energy

Processes and products

204DIG9, C25D 500, C25D 518

Patent

active

044902190

ABSTRACT:
A substrate such as carbon, graphite, or various semiconductors is coated with a "two-dimensional" thin film form of flat isolated crystallites of platinum, palladium or silver to form a catalyst useful in a fuel cell. The method of formation of the catalyst is to place the substrate in an electrolyte such as H.sub.2 PtCl.sub.6 about 1% and one molar sulfuric acid. The potentiostatic pulse plating method is employed. A high potential pulse of very short duration is followed by a low potential of substantial duration. The very high potential nucleates crystals at various randomly distributed nucleation sites such as imperfections in the surface of the substrate. The resulting catalyst has a large surface area of hexagonal crystals about 20 to 40 Angstroms in diameter.

REFERENCES:
patent: 3276976 (1966-10-01), Juliard
patent: 3616434 (1971-10-01), Hausner
patent: 3994785 (1976-11-01), Rippere
patent: 4038158 (1977-07-01), Bursey
Plating, Aug. 1969, pp. 909-913.

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