Process and apparatus for producing surface treated metal foil

Chemistry: electrical and wave energy – Processes and products

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Details

204 40, 204216, 204231, C25D 104, C25D 1700

Patent

active

044902182

ABSTRACT:
A process and apparatus for producing surface treated metal foil is described. The process comprises plating a relatively smooth metal foil onto a cathodic surface and thereafter forming a dendritic layer on the foil and firmly bonding it thereto while the foil is still on the cathodic surface. In one embodiment, the apparatus comprises an electrolytic cell containing an electrolyte, a rotating drum cathode at least partially immersed in the electrolyte, at least two primary anodes and a plurality of treatment anodes embedded in one of the primary anodes.

REFERENCES:
patent: Re30180 (1979-12-01), Wolski et al.
patent: 3220897 (1965-11-01), Conley et al.
patent: 3293109 (1966-12-01), Luce et al.
patent: 3585010 (1971-06-01), Luce et al.
patent: 3674656 (1972-07-01), Yates
patent: 3699018 (1972-10-01), Carlson
patent: 3799847 (1974-03-01), Vladimirovna et al.
patent: 3857681 (1974-12-01), Yates et al.
patent: 3901785 (1975-08-01), Vladimirovna
patent: 3918926 (1975-11-01), Wolski et al.
patent: 4049481 (1977-09-01), Morisaki
patent: 4053370 (1977-10-01), Yamashita et al.
patent: 4082591 (1978-04-01), Morisaki et al.

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