Photoresist composition of 1-(1'-cyanoethenyl)adamantane

Details Photoresist composition of 1-(1'-cyanoethenyl)adamantane Photoresist composition of 1-(1'-cyanoethenyl)adamantane

1994-07-15

1995-03-21

Zitomer, Fred

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

430270, 526282, 585 21, 585317, G03C 173

Patent

active

053996470

ABSTRACT:
New copolymers are disclosed which are copolymers of 1-(1'-cyanoethenyl)adamantane or 2-norbornene-2-carbonitrile monomer with an acrylate or methacrylate monomer. Resist compositions are also disclosed which comprise one of the disclosed new copolymers and an acid generator. The resist compositions advantageously form thinner resist films on substrates and, on the exposure to light having a short wavelength, such as KrF and ArF excimer laser light, provide finer resist pattern required in the production of advanced, highly integrated semiconductor devices. Novel 1-(1'-cyanoethenyl)adamantane is also disclosed.

REFERENCES:
patent: 3457318 (1969-07-01), Capaldi
patent: 5053568 (1991-10-01), Chen

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