Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-07-07
1995-03-21
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, G01N 2726, G01N 2744
Patent
active
053992555
ABSTRACT:
A platform for conducting electrophoresis includes a support, at least one first electrode which extends upward from the support, and at least one second electrode which also extends upward from the support. An electrophoresis plate is deposited on the support during a medical testing procedure. The electrophoresis plate includes a substrate and an electrophoretic medium layer on the substrate, the electrophoretic medium layer having first and second end regions. The at least one first electrode of the platform extends through a corresponding hole in the substrate to electrically contact the first end region of the electrophoretic medium layer and the at least one second electrode extends through a corresponding hole in the substrate to electrically contact the second end region of the electrophoretic medium layer. This arrangement makes it easy to install the electrophoresis plate on the platform and also provides good electrical contact with the electrodes. Holes are preferably provided in the first and second end regions of the electrophoretic medium layer above the holes in the substrate, and bubbles generated at the electrodes due to electrolytic decomposition of water in the electrophoretic medium layer escape through these holes. A bipolar power supply is preferably used in order to subdue arcing.
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Helena Laboratories Corporation
Niebling John
Starsiak Jr. John S.
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