Method of making semiconductor devices

Details Method of making semiconductor devices Method of making semiconductor devices

1983-02-14

1984-08-14

Smith, John D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

156653, 156657, 427 93, 427 94, H01L 2176

Patent

active

044657056

ABSTRACT:
A method of masking semiconductor devices provided with selectively formed oxide film patterns, can be made by very precisely copying from selective oxidation mask patterns.
The method in accordance with the present invention comprises

REFERENCES:
patent: 3900350 (1975-08-01), Appels
patent: 3911168 (1975-10-01), Schinella
patent: 3961999 (1976-06-01), Antipov
patent: 4016007 (1977-04-01), Wada
patent: 4113515 (1978-09-01), Kooi
patent: 4292156 (1981-09-01), Matsumoto
Appels "Local Oxidation of Silicon . . . " Philips Res. Repts. 25, pp. 118-132, 1970.

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