Photomask comprising a holding frame and reinforcing member with

Details Photomask comprising a holding frame and reinforcing member with Photomask comprising a holding frame and reinforcing member with

1995-03-16

1996-12-31

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430323, 378 34, 378 35, G03F 900

Patent

active

055893040

ABSTRACT:
Disclosed is a mask structure which includes a membrane on which a pattern is formed or to be formed, a holding frame for holding the membrane, and a reinforcing member for reinforcing the holding frame, wherein the reinforcing member comprises ceramics and wherein the reinforcing member and the holding frame are bonded to each other through a film oxide of the ceramics. Also disclosed is a mask structure which includes a membrane on which a pattern is formed or to be formed, a holding frame for holding the membrane, and a reinforcing member for reinforcing the holding frame, wherein the reinforcing member has a major constituent the same as that of the membrane.

REFERENCES:
patent: 5101420 (1992-03-01), Kushibiki et al.
patent: 5199055 (1993-03-01), Noguchi et al.

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