Structure and method for direct calibration of registration meas

Details Structure and method for direct calibration of registration meas Structure and method for direct calibration of registration meas

1991-06-28

1994-01-18

Black, Thomas G.

Boots, shoes, and leggings

36457101, 356401, G01B 1100

Patent

active

052804372

ABSTRACT:
To calibrate a registration measurement system for use in semiconductor fabrication processes, a calibration structure is provided. The calibration structure includes at least one zero offset registration structure and a plurality of non-zero offset registration structures. By measuring the displacement of the zero registration, structure at 0.degree. and 180.degree., the tool induced shift (TIS) of the registration measurement system may be determined. Then, by measuring the displacement of the zero offset registration structure at 0.degree., 90.degree., 180.degree., and 270.degree. the initial TIS determination is verified and the presence or absence of astigmatism is established. When TIS and astigmatism have been accounted for, all of the registration structures, both zero and non-zero, are measured at an angular orientation of 0.degree. to determine the systematic errors present in the measurement. Once these errors are determined, the registration measurement system is calibrated to alleviate these errors.

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