Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-02-14
1993-11-09
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419212, 20429812, 20429819, C23C 1434
Patent
active
052599418
ABSTRACT:
A vaporizer is described for use in an apparatus for the coating of substrate under vacuum, the vaporizer comprising a holder and a target plate releasably securable to the holder, with the target plate being acted on at its rear side by a coolant medium which flows through the holder. In order to make rapid interchange of the target plate possible while simultaneously optimizing the cooling, the target plate is fixed to the holder via a clamped connection with intermeshing clamping surfaces.
REFERENCES:
patent: 4169031 (1979-09-01), Brors
patent: 4209375 (1980-06-01), Gates et al.
patent: 4318796 (1982-03-01), Nishiyama et al.
patent: 4434042 (1984-02-01), Keith
patent: 4448652 (1984-05-01), Pachonik
patent: 4468313 (1984-08-01), Okumura et al.
patent: 4517070 (1985-05-01), Kisner
patent: 4966676 (1990-10-01), Fukasawa et al.
Hauzer Holding BV
Nguyen Nam
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