Method for manufacturing exposure mask

Details Method for manufacturing exposure mask Method for manufacturing exposure mask

1992-03-18

1995-11-21

Seidleck, James J.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430324, 430326, G03F 900

Patent

active

054685761

ABSTRACT:
A method for manufacturing an exposure mask provided with a substrate for transmitting an exposure light and with phase shifters arranged at prescribed intervals on the substrate for shifting the phase of the exposure light transmitted through the substrate by a half wavelength as compared with the phase of the exposure light transmitted through both the substrate and an opening between the phase shifters consists of the steps of preparing a solution containing a phase shifter material, arranging resist layers at the prescribed intervals on the substrate, immersing the substrate with the resist layers in the solution, forming the phase shifters on the substrate between the resist layers by a prescribed thickness by depositing the material of the phase shifter from the solution, and removing the resist layers from the substrate to form the openings.

REFERENCES:
patent: 4468420 (1984-08-01), Kawahara et al.
patent: 5178975 (1993-01-01), Chiong et al.
patent: 5260162 (1993-11-01), Khanna et al.

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