Method for forming an orientation film including coupling an org

Details Method for forming an orientation film including coupling an org Method for forming an orientation film including coupling an org

1993-12-08

1995-11-21

Owens, Terry J.

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427108, 427165, 427547, 359 76, 428 1, B05D 314, G02F 113

Patent

active

054685192

ABSTRACT:
Methods for forming an orientation film comprising a first step wherein a silane coupling agent is chemically adsorbed on a substrate surface, and a second step wherein an organic compound comprising a functional group capable of coupling with the silane coupling agent is coupled with the silane coupling agent. The second step includes a) applying a magnetic or electrical field in a selected direction to a mixture of 1) a liquid crystal compound being in a liquid crystal phase when heated and 2) the organic compound, b) contacting the substrate with the mixture which is in the applied magnetic or electrical field, and c) heating the mixture which is contacted with the substrate to a temperature sufficient for coupling of the silane coupling agent and the organic compound during the magnetic or electrical field application. The organic compound coupled with the silane coupling agent is directed toward a direction corresponding to the selected direction of the magnetic or electrical field.

REFERENCES:
patent: 4892392 (1990-01-01), Broer
patent: 5256456 (1993-10-01), Ogawa
patent: 5315419 (1994-05-01), Soupe et al.
T. Uchida et al., Electronics and Communications in Japan, 58-C(4):132-135 (Apr. 1975).
Patent Abstracts of Japan, vol. 7, No. 238 (Oct. 1983).
Patent Abstracts of Japan, vol. 12, No. 114 (Apr. 1988).
Patent Abstracts of Japan, vol. 11, No. 386 (Dec. 1987).

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