Electron microscopy coating apparatus and methods

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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118 491, 118500, 118503, 204192N, C23C 1500

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active

040960552

ABSTRACT:
An electron microscopy coating apparatus and coating methods incorporate a specimen mounting arrangement which is used both for coating specimens which are to be viewed by scanning electron microscopy (SEM) and for coating specimens which are to be viewed by transmitted electron microscopy (TEM) and for coating specimens for the recently developed scanning-transmitted electron microscopy (STEM).
The coating apparatus and method includes a hood and a mixer disc for coating by cold cathode sputtering and can also be used (with arc type electrodes in place of the hood and mixer disc) for coating by either charged ion evaporation or straight film evaporation.
A biasing direct current provides a differential charge for cold cathode sputtering and charged ion evaporation.
For charged ion evaporation the negative lead of the direct current is connected to one electrode of the evaporator and the positive lead of the direct current is connected to the base to provide a differential charge (a negative charge on the evaporated ion and a positive charge on the specimen) to attract the evaporated ions to the specimen.

REFERENCES:
patent: 3329601 (1967-07-01), Mattox
patent: 3351543 (1967-11-01), Vanderslice
patent: 3563873 (1971-02-01), Beyer
patent: 3633537 (1972-01-01), Howe
patent: 3656453 (1972-04-01), Tousimis
patent: 3669871 (1972-06-01), Elmgren et al.
patent: 3783822 (1974-01-01), Wollam
patent: 3858547 (1975-01-01), Bergfelt
patent: 4013830 (1977-03-01), Pinch et al.

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