Projection aligner and exposure method

Details Projection aligner and exposure method Projection aligner and exposure method

1989-02-08

1990-06-26

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 46, 355 67, G03B 2742

Patent

active

049376195

ABSTRACT:
There are disclosed a projection aligner, and an exposure method, capable of largely increasing the effective focus latitude of a fine pattern by using light having a plurality of different wavelengths to perform projection exposure and by setting a plurality of focal planes on an identical optical axis by means of chromatic aberration of the projection lens. The present invention makes it possible to cope with insufficient depth of focus caused by a shortened wavelength of exposure light, an increased numerical aperture of the projection lens, increased uneven topography of the substrate surface incurred from the device structure formed in three dimensions, inclination of the substrate, and field curvature of the projection lens, for example.

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patent: 4541712 (1985-09-01), Whitney
patent: 4619508 (1986-10-01), Shibuya et al.
patent: 4789222 (1988-12-01), Ota et al.
patent: 4811055 (1989-03-01), Hirose
patent: 4812880 (1989-03-01), Ogawa et al.
patent: 4819033 (1989-04-01), Yoshitake et al.
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patent: 4851882 (1989-07-01), Takahashi et al.
patent: 4851978 (1989-07-01), Ichihara
patent: 4853756 (1989-09-01), Matsuki
"Semiconductor Lithography Technique", Koichiro Ho, Chapter 4, pp. 87-93.
Journal of Vacuum Science and Technology, B-1(4), 1983, pp. 1235-1240.

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