Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1988-10-14
1990-06-26
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250397, 250398, H01J 3730
Patent
active
049374583
ABSTRACT:
In an electron beam lithography apparatus having an electron gun for producing an electron beam, an electron beam shaping lens and a deflector for deflecting the electron beam in accordance with a pattern to be drawn on an object, a blanking electrode unit and a stop electrode unit having an aperture therein are provided so that when a pattern need not be drawn the electron beam is deviated by the blanking electrode unit away from the aperture in the stop electrode unit. In one embodiment, the stop electrode unit serves to detect the amount of that portion of the electron beam which does not pass through the aperture so that a detection value corresponding to the detected amount of the electron beam is compared with a reference value. When the detection value exceeds the reference value, it is determined that a shot of pattern drawing is effected with the electron beam.
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patent: 4710640 (1987-12-01), Kawasaki
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Anderson Bruce C.
Hitachi , Ltd.
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