Process for the production of electroluminescence element, elect

Electric lamp and discharge devices – With luminescent solid or liquid material – Solid-state type

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

313503, 313511, 313512, H01J 162

Patent

active

059363460

ABSTRACT:
An electroluminescence element provided with a luminescent layer sandwiched between two electrodes on an insulating substrate. The luminescent layer is composed of zinc sulfide with a fluoride or a luminescent center element added, wherein the X-ray diffraction spectrum thereof has only a single peak at an X-ray diffraction angle from the luminescent layer, ranging from 25.degree. to 30.degree. according to a thin film X-ray diffraction measurement method using Cu-Kd radiation, and no other peaks of the X-ray diffraction spectrum exist at an X-ray diffraction angle of 27.degree..

REFERENCES:
patent: 4508610 (1985-04-01), Freeman
patent: 4675092 (1987-06-01), Baird
patent: 4707419 (1987-11-01), Ogura
patent: 5369333 (1994-11-01), Inoguchi
Ohwaki et al., "High-Brightness Blue, Red, and Stable Green Thin-Film Electroluminescent Devices", Electrical Communications Laboratories, 1987, pp. 811-818.
Hirabayashi et al., "Color Electroluminescent Devices Prepared by Metal Organic Chemical Vapor Deposition", Japanese Journal of Applied Physics, Sep., 1987, vol. 26, No. 9, pp. 1472-1476.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for the production of electroluminescence element, elect does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the production of electroluminescence element, elect, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of electroluminescence element, elect will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1122966

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.