Method and apparatus for the fabrication of semiconductor photom

Details Method and apparatus for the fabrication of semiconductor photom Method and apparatus for the fabrication of semiconductor photom

1998-10-22

1999-08-10

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059357401

ABSTRACT:
The present invention provides a method and apparatus of fabricating photomasks. The photomasks may be fabricated from a photomask blank structure having multiple layers. Upon patterning of these multiple layers by standard photolithographic processes, a photomask is created which is capable of phase-shifting incident light by various degrees, which may be 0.degree., 60.degree., 120.degree., and 180.degree..

REFERENCES:
patent: 5229255 (1993-07-01), White
patent: 5308721 (1994-05-01), Garofalo et al.
patent: 5308722 (1994-05-01), Nistler
patent: 5405721 (1995-04-01), Pierat

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