Method and apparatus for attaching a target to the cathode of a

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

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204298, C23C 1500

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active

042049369

ABSTRACT:
An improved method and apparatus for attaching a target to the cathode of a cathode sputtering system is disclosed which includes a ferromagnetic retainer which releasably clamps the target to the cathode by virtue of its attraction to existing permanent magnets in the cathode assembly. An optional ferromagnetic ring may also be provided around the periphery of the target to further hold the target to the cathode assembly.

REFERENCES:
patent: 3216652 (1965-11-01), Knauer
patent: 3878085 (1975-04-01), Corbani
patent: 4060470 (1977-11-01), Clarke
patent: 4116806 (1978-09-01), Love et al.
E. M. DaSilva, Sputtering Cathode Holder with Interchangable Targets, IBM Technical Disclosure Bulletin, vol. 14, No. 1, (June 1971), pp. 221-222.
Brochure: "2400-85A Planar Magnetron Sputtering System", Perkin-Elmer, Ultek, Inc., Palo Alto, Ca., 3/1977.

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